Near IR Objective Lenses (M ePLAN NIR Series)

Infinity correct design objective lens with high N.A. for laser material processing with YAG laser (1064 nm),
Normal brightfield ovservation is also available.

  • Infinity correct design.
  • Conpensation design for visible range (640 nm) and near infrared range(940 – 1064 nm).
  • High resolution desigh.
  • Parfocal distance: 45 mm.
  • Working distance is adjustable for 50 X objective lens.
  • Provided with protection glass for 100 X (N.A. 0.75) objective lens to resist high power raser.
Cat. No. M-ePLAN-NIR50 M-ePLAN-NIR50 M-ePLAN-NIR50
Magnification 50 X 100 X 100 X
NA
(Numerical Aperture)		 0.65 0.75 0.8
WD
(Working Distance)		 3.1 – 3.83 mm 3.4 mm 3.3 mm
F
(Focal length)		 3.6 mm 1.8 mm 1.8 mm
R
(Resolving Power)		 0.42 um 0.37 um 0.42 um
DOF
(Depth Of Focal)		 ±0.65 um ±0.49 um ±0.43 um
FD
(Field Diameter)
φ25		 φ0.5 mm φ0.25 mm φ0.25 mm
Field Area on 1/2’CCD 0.1 x 0.13 mm 0.05 x 0.06 mm 0.05 x 0.06 mm